Modeling of thermal modes of action of laser radiation on a photocell with a thin-film structure ZnO-amorphous silicon on a glass substrate
Abstract
Modeling of thermal modes of action of laser radiation on a photocell with a thin-film structure ZnO-amorphous silicon on a glass substrate
Incoming article date: 07.06.2017The influence of the laser material on the structure of the photocell based on thin films of zinc oxide and amorphous silicon on glass. It was modeled recrystallization processes in the solid state, considered the interaction of the surface of silicon by pulsed laser radiation, calculations are made for the surface temperature at the recrystallization of the amorphous film on Nd:YAG laser installation with length wave 532 nm. The proposed thermal model of the solution of the problem showed that the structure melt is already at the earliest stage of processing and the temperature distribution in the amorphous layer will depend on the structure of the ZnO film, as evidenced by modeling in ANSYS. According to the results of experimental studies performed, it can be said that the thermal conditions at the plant are poorly worked out, as evidenced by the roughness of the film of the amorphous layer. The mechanism of crystallization of the melt also requires refinement. The obtained results showed the prospects of the direction of silicon-on glass and ZnO
Keywords: solar cells , laser recrystallization , an amorphous layer , ZnO film , thermal model , modeling of thermal modes , tube scan