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Selective growth of ZnO nanorods arrays by hydrothermal method on silicon

Abstract

Selective growth of ZnO nanorods arrays by hydrothermal method on silicon

M.Ju. Stupko, N.V. Ljanguzov, A.L. Nikolaev, E.M. Kajdashev

In the present work we have carried out studies of the processes of growth of zinc oxide nanorods by hydrothermal method on silicon substrates. As sublayer catalyst used growth caused by laser deposition of zinc oxide, various thicknesses. Studied selective growth of nanorods on the microstructure of thin-film sub-layers of zinc oxide obtained by laser deposition. The optimal conditions for the synthesis of: the concentration of Zn (NO3) 2 - 0.4 mol / l, hexamethylenetetramine - 0.4 mol / l, the concentration of NH3 · H2O - 0,01 mol / L -0.01, process time 4:00, the process temperature is 80 ° C. Sublayer thickness of zinc oxide, as shown by experiment, the growth of the rods has no noticeable effect. Oriented arrays of nanorods were obtained up to 500 nm and a diameter of 60-150 nm.
Keywords: zinc oxide nanorods and micro-oriented arrays of nanorods, hydrothermal synthesis method, selective growth, thin film underlayer.

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